157nm氟化物光学薄膜制备

Preparation of 157 nm Fluoride Optical Thin Films

为了研制低损耗、高性能的157nm薄膜,研究了常用的六种宽带隙氟化物薄膜材料.制备和研究了六种氟化物单层膜,并以不同高低折射率材料对,设计制备了157nm高反膜和增透膜;讨论和比较了不同氟化物材料对所组成的高反膜和增透膜的反射率、透射率、光学损耗等特性.结果表明,采用NdF3/AlF3材料对设计制备的157nm高反膜的透过率为1.7%,反射率接近93%,散射损耗为2.46%,已经与吸收损耗相当;以AlF3/LaF3材料对设计制备的157nm增透膜的剩余反射率低于0.17%.

In order to develop low loss,high-performance 157 nm fluoride coatings,157 nm fluoride optical thin film performance is studied.On the base of fluorede single layer study,157 nm HR and AR coatings are designed and deposited with different fluoride high and low refractive index materials.Their reflectivity,transmittance,optical loss and other properties are discussed and compared.In the analysis of several fluoride films and their combined properties,the fluoride combinations of 157 nm HR and AR coatings are optimized selected.To get a high-performance 157 nm HR coating,the NdF3/AlF3 HR mirror is designed and made,and its reflectance is nearly up to 93%.Under the present experimental conditions,the LaF3/AlF3 157 nm AR coanting is designed and deposited,and its residual reflectance is less than 0.17%.