摘要
本文介绍了正研制的氢氦离子注入机的结构和各部分的主要性能指标。它的最高能量为200 keV,可按一定比例同时用氢氦两种离子进行注入实验。该机经调试,各项主要指标已达设计要求,工作稳定可靠。
In this paper, we report a H2^＋/He^＋ ion implanter developed at CIAE, aiming at producing 200 keV H2^＋ and He^＋ beams simultaneously. The ion optics, ion source, electronics and mechanical designs are described in detail. Ion ratio of the beams can be adjusted to meet the requirements of experiment. Test results show that the H2^＋/He^＋ ion implanter works reliably and specifications of the design are achieved.
出处
《核技术》
CAS
CSCD
北大核心
2010年第12期937-940,共4页
Nuclear Techniques
基金
973项目--ADS资助
关键词
离子注入机
透镜
离子源
质谱
Ion implanter, Lens, Ion source, Mass spectrum
