准分子真空紫外改善材料表面结构与性能的研究

Study on surface structure and properties of materials modified with excimer vacuum ultraviolet

简述了准分子VUV光源及反应器的结构与特点,用氙172nm真空紫外灯在不同气氛条件下照射氧化铜片、聚丙烯板(PP)、镀金薄膜,以光电子能谱、全反射红外光谱等分析材料表面,研究材料表面结构与性能的变化.结果表明,控制反应气氛,室温下172nm VUV即可清除铜片表面的污染物,还原铜片表面的氧化膜及活化镀金薄膜,在PP表面引入羟基或羰基,能有效地改善材料的表面性能.

The configuration and features of the DBD excimer VUV lamp as well as VUV reactor were introduced briefly and the surface modification of materials with VUV was conducted. Oxidized copper sheets,polypropylene plates and gold plated pads on substrates were exposed to the emissions of Xe excimer 172 nm lamps in different gaseous environments at ambient temperature; the structure and properties of the surface were analyzed with X-ray Photoelectron Spectroscope and attenuated total reflectance FTIR. At ambient temperature and proper gaseous conditions,the 172 nm VUV can removed contaminants from the copper sheets,reduced cupric oxides into copper metal,activated the gold pads and introduce hydroxyl and carbonyl groups into the plastic surface. Xe excimer 172 nm VUV lamps can improve surface performance of materials efficiently.