直流磁控反应溅射法制备的钒氧化物薄膜及其光谱研究

Preparation and Spectroscopy Investigation of Vanadium Oxide Films Deposited by DC Magnetron Sputtering

用直流磁控反应溅射法和不同基底温度下在玻璃底上沉积微纳结构的氧化钒薄膜,通过X射线衍射、电子扫描显微镜、UV-Vis透射、红外和拉曼光谱研究了薄膜的结构特性。在低温下制备的薄膜表现出高的光学透过特性,在基底温度低于200℃下制备的薄膜具有无定形结构,而在基底温度高于200℃时制备的薄膜具有多晶结构。薄膜的光学参数使用经典模型计算,通过测量和拟合透射光谱获得了薄膜的禁带宽度变化规律。

Vanadium oxide films were deposited at different substrate temperatures up to 400 ℃ by DC magnetron sputtering,and through the method of the X-ray diffraction,electron scanning microscopy,infrared and Raman spectra,the present paper studies the structure properties of those films,and through the method of spectrum measuring and fitting,this paper studies the optical properties of the films.At low temperature of preparation the optical films have high optical transmittance.The films prepared at low substrate temperature（lower than 200 ℃） have amorphous structure and some films prepared at high substrate temperatures（higher than 200 ℃） have polycrystalline structure.The films＇ optical parameters were achieved by using classic model to fit the characteristic of transmittance.