以丙烯为碳源气的化学气相沉积模型

Model of chemical vapor deposition(CVD) for propylene as precursor

以丙烯为碳源气,考察了热解炭在化学气相沉积中的生长过程:包括丙烯裂解后的脱氢、断链、歧化以及加成等复杂的化学过程,还包括裂解产物在气相中通过在自由活化点上(基体表面或聚合芳香烃网平面边缘处)的加成反应以及在基体表面通过物理吸附进行堆积的过程。不同结构热解炭的生成,主要取决于丙烯裂解后的中间产物在基准面进行加成反应后的产物。

The process of chemical vapor deposition（CVD） has been analyzed using propylene as precursor.The process not only include dehydrogenation,disconnection,divergence and addition reactions of the small linear or aromatic species after propylene cracking,but also include the addition reactions of reactive intermediates of gas phase at active sites existing mainly at the edges of graphene layers and the physisorption or condensation of large polycyclic aromatic hydrocarbons formed in the gas phase on the basal plane.The structures of reactive intermediates of gas phase after the addition reactions is the key to the microstructure of pyrocarbon.