CVD合成石英玻璃的结构均匀性研究

Research of Structural Stress of CVD Synthetic Silica Glass

高纯石英玻璃在光学、光通信及惯性导航中的应用要求其具备高的结构均匀性。CVD(化学气相沉积法)合成高纯石英玻璃的工艺条件决定了它具备的结构状态。对使用卧式和立式两种工艺合成高纯石英玻璃的结构均匀性进行了研究,通过应力测试和假想温度测试,测得卧式工艺制得玻璃在平行于沉积面方向具有环状不均匀结构,并导致结构应力的环状分布,在垂直于沉积面方向结构均匀;立式工艺制得玻璃在垂直于沉积面方向存在层状结构分布,每层厚度为0.16 cm,在平行于沉积面方向结构均匀性好,直径8 cm范围内无结构应力。

High structural homogeneity of high-purity silica glass is required in optics,optical communication and inertial navigation field.The structural property of Chemical Vapor Deposited silica glass is determined by the process conditions.The structural homogeneity of silica glass produced by horizontal and vertical process separately was studied.By stress birefringence test and fictive temperature test,silica glass produced by horizontal process has ring structure at the horizontal direction,and homogeneous structure an the vertical direction;silica glass produced by vertical process has layered structure with the thickness of 0.16 cm,and fine homogeneous structure at the horizontal direction,and without structural stress within the diameter of 8 cm.