高性能石英玻璃精密退火工艺研究

Research on Precision Annealing of High Performance Silica Glass

石英玻璃是应用非常广泛的高新技术材料。应用于X系统的石英玻璃除要求具备良好透光性能和耐宇宙射线辐照外,还要求大直径及厚度要求,其应力双折射为Ⅰ类和光学均匀性达到5×10-6。长期以来我国大尺寸(直径>20 cm)石英玻璃的光学均匀性在10-5,远不能满足航天等领域的技术需求。实验以Ⅲ类石英玻璃(SiCl4化学气相沉积法合成石英玻璃)为研究对象,将现代退火理论应用到石英玻璃精密退火过程中,结合石英玻璃精密退火各过程数学模型,确定了各工艺参数并制定了精密退火工艺路线,有效消除了石英玻璃内应力、提高了光学均匀性,退火效率大幅提高,获得了满足要求的高性能石英玻璃。

The silica glass is an advanced technology material that applied widely.But it is very difficult to make large size silica glass（diameter20 cm） with high optical homogeneity（10-6）,because the manufacturing process of silica glass has substantial effects on its optical homogeneity.At present,the optical homogeneity of the large silica glass has not reached to 10-5,the requirement for spaceflight technology,which seriously blocked the development of spaceflight technology in our country. In this study,With the modern annealing theory of glass,the fine annealing theory of silica glass was deeply discussed and the annealing model for each step was established in the study,entitled the four-segment annealing curve.According to it,high performance silica glass with few stress and excellent optical homogeneity was obtained.