摘要
针对近年来国内外的化学气相沉积(CVD)金刚石膜的抛光方法(机械抛光、热化学抛光、化学辅助机械抛光、电蚀抛光和高能抛光等)的原理、优缺点进行了分析论述,指出了今后金刚石膜抛光研究中亟待解决的问题,并展望了CVD金刚石膜抛光技术的发展趋势。
The principles of various polishing CVD diamond films at home and abroad in recent years were summarized and their advantages and disadvantages were also analyzed.The polishing technology of CVD diamond films mainly included mechanical polishing,chemical-assisted mechanical polishing,eletro-discharge machining polishing,high energy polishing and so on.Meanwhile,the problems to solve urgently in the future about polishing CVD diamond films were proposed and the trend of polishing CVD diamond films was forecasted.
出处
《中国机械工程》
EI
CAS
CSCD
北大核心
2011年第1期118-125,共8页
China Mechanical Engineering
基金
国家自然科学基金资助项目(50675142)
关键词
化学气相沉积
金刚石膜
抛光技术
表面粗糙度
chemical vapor deposition（CVD）
diamond film
polishing technology
roughness
