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A total dose radiation model for deep submicron PDSOI NMOS

A total dose radiation model for deep submicron PDSOI NMOS
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摘要 In most of the total dose radiation models, the drift of the threshold voltage and the degradation of the carrier mobility were only studied when the bulk potential is zero. However, the measured data indicate that the total dose effect is closely related to the bulk potential. In order to model the influence of the bulk potential on the total dose effect, we proposed a macro model. The change of the threshold voltage, carrier mobility and leakage current with different bulk potentials were all modeled in this model, and the model is well verified by the measured data based on the 0.35μm PDSOI process developed by the Institute of Microelectronics of the Chinese Academy of Sciences, especially the part of the leakage current. In most of the total dose radiation models, the drift of the threshold voltage and the degradation of the carrier mobility were only studied when the bulk potential is zero. However, the measured data indicate that the total dose effect is closely related to the bulk potential. In order to model the influence of the bulk potential on the total dose effect, we proposed a macro model. The change of the threshold voltage, carrier mobility and leakage current with different bulk potentials were all modeled in this model, and the model is well verified by the measured data based on the 0.35μm PDSOI process developed by the Institute of Microelectronics of the Chinese Academy of Sciences, especially the part of the leakage current.
出处 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2011年第1期33-35,共3页 半导体学报(英文版)
基金 Project supported by the State Key Development Program for Basic Research of China(No.2006CB3027-01)
关键词 PDSOI NMOS total dose radiation model bulk potential leakage current PDSOI NMOS total dose radiation model bulk potential leakage current
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