钴硼合金功能膜的制备与结构分析

Studies on Preparation and Structure of Co-B Functional Alloy Films

以ＮａＢＨ４为还原剂用化学沉积方法成功制备了钴硼合金功能膜。通过大量试验，优化出一种沉积速率较快的镀液配方与工艺。采用ＸＲＤ、ＴＥＭ等仪器对沉积膜的镀态结构和组织性能进行了测试，研究了合金的沉积速率与结构。试验获得的合金膜显微硬度较高，表面光亮致密，且与基体结合牢固；虽然ＸＲＤ的检测结果显示沉积膜为非晶态结构，ＴＥＭ的进一步分析表明，沉积膜是非晶态＋晶态的过渡态结构，从而对钴硼合金沉积膜作了较为全面的评价。

Co--B functional alloy films were successfully electroless--deposited by usingNaBH4 as the reducing agent. An optimum plating bath with higher deposition rate was obtained on the basis of a large number of experimental results. The structure and propertiesof the as--plated films were studied by means of XRD, TEM etc. The changes of the deposition rate and the structrue of the films were investigated. The microhardness of the films isrelatively high. The surface of the as--plated films is bright. The adhension of the films onthe substrate is high. Although the XRD results showed that the as--plated films are amorphous, further investigation based on the results obtained through TEM observation indicated that the films are mixed phase consisted of amorphous phase and fine crystals. Therefore the films are analyzed extensively.