溅射压强对TiN/SiN_x纳米多层膜微观结构及力学性能的影响

Influence of sputtering pressure on microstructure and mechanical properties of TiN/SiN_x multilayer coatings

利用磁控溅射方法在不同溅射压强条件下制备了TiN/SiNx纳米多层膜.多层膜的微观结构及力学性能分别用X射线衍射仪、原子力显微镜及纳米压痕仪来表征.结果表明随着溅射压强的增大,多层膜的界面变模糊,TiN层的择优取向由(200)晶面过渡到(111)晶面.与此同时,多层膜的表面粗糙度增大,硬度和弹性模量随溅射压强的增大而减小.多层膜力学性能的差异主要是由于薄膜的周期性结构及致密度存在差异所致.

TiN /SiNx multilayer coatings were deposited at different deposition pressure by reactive magnetron sputtering. The microstructure and mechanical properties of the coatings were characterized using X-ray diffraction （ XRD）,atomic force microscopy （AFM） and nanoindentation. The results showed that the layer structure became rough and the preferred orientation of TiN transferred from （200） to （111） plane with the increase of deposition pressure. Surface roughness of the coatings increased but the hardness and elastic modulus decreased with increasing deposition pressure. The variation of mechanical properties are attributed to the changes in layer structures and the densities of the coatings.