不同气体氛围下硅量子点的结构及其发光机理

The structure of silicon quantum dots and key factors for emission in different environment

纳秒脉冲激光在氮气、氧气和空气等不同氛围中加工出的硅量子点都有光致荧光(PL)的发光增强效应,并且在700nm波长附近观察到了受激辐射.在不同氛围下生成的样品有几乎相同的PL光谱分布,其原因是不同氛围下加工出的样品带隙中有相同的电子态分布.计算结果显示:当硅量子点表面被氮或氧钝化后,在带隙中能够形成几乎相同的局域电子态,这种局域电子态可以俘获来自导带的电子,从而形成亚稳态,这是PL发光增强乃至产生受激辐射的关键因素.

Silicon quantum dots fabricated by nanosecond pulse laser in nitrogen,oxygen or air environment have enhancement in photoluminescence emission. The stimulated emission was observed at about 700 nm. It is difficult to recognize the difference between the photoluminescence peaks from samples in different environments,which is because of the same structure of the electron states in the band gap for different samples. The calculation results show that the same structure of the localized states forms in the band gap when silicon dangling bonds on surface of quantum dots are passivated by nitrogen or oxygen. It is the localized states that could catch the electrons from the conduction band to form metastable states,which is the key factor to enhance photoluminescence emission.