高功率脉冲磁控溅射ZrN纳米薄膜制备及性能研究

Fabrication and Surface Properties of ZrN Films by High Power Pulsed Magnetron Sputtering

采用高功率复合脉冲磁控溅射的方法(HPPMS)在不锈钢基体上制备ZrN纳米薄膜,并研究了不同的工作气压对薄膜形貌、相结构及各种性能的影响。采用SEM、XRD对其表面形貌和结构进行分析,发现制备的薄膜表面光滑、致密,无大颗粒,主要以ZrN(111)和ZrN(220)晶面择优生长,并呈现出多晶面竞相生长的现象。对薄膜硬度、弹性模量、耐磨性和耐腐蚀性的测试发现薄膜具有很高的硬度,最高可达33.1 GPa,同时摩擦系数均小于0.2,耐腐蚀性也都有很大提高,腐蚀电位比基体提高了0.28 V,腐蚀电流下降到未处理工件的1/5。工作气压较低时,薄膜耐磨耐蚀性能都较好,但在较高气压时,耐磨耐蚀性能出现一定的下降。

ZrN nano-films were prepared by high power pulsed magnetron sputtering technique （HPPMS） under the different work pressures.SEM and XRD were used to investigate the surface morphologies and the phase structure of the films.The results show that the surface of the prepared ZrN films was smooth and dense,and they have no any macroparticles.The grains of the films grow under the preferred orientations of ZrN（111） and ZrN（220）,and show the combined texture with several preferred orientations.The films have very high hardness of 33.1GPa and lower friction coefficient of 0.2.Corrosion resistance has been improved with an increase of the corrosion potential by 0.28V and a decrease of corrosion current by a factor of 5.The samples fabricated at low work pressure possess a better surface properties,but the surface hardness,wear-resistance and corrosion resistance show a decrease at high gas pressure due to more frequent particle collisions.