化学气相沉积(CVD)金刚石薄膜的主要制备方法及应用

介绍了化学气相沉积金刚石薄膜的主要制备方法：热灯丝法、微波法、等离子体喷射法、火焰燃烧法。 Ｃ Ｖ Ｄ 金刚石膜的应用。

Main production m ethods and application of C V D diam ond film W A N G Shaoyan, W U Xiaobo, W A N G Zhina, L I U Xiujun, D I A O Xigang, J I A N G Long( Hebei Mechatronics Interm ediate Pilot Production Base, Shijiazhuang 050081, China) Abstract Main production m ethods of chem ical vapor deposition diam ond film s are H F C V D, M P C V D, D C Plasm a Jet C V D and F L A M E. Application of C V D diam ond film isproposed. Key w ords Chem ical vapor deposition, Diam ond f