Ni含量对FeCoNiB软磁薄膜微波电磁性能的影响

Effect of NI on the electromagnetic characteristics of FeCoNiB soft magnetic thin films

为了改良磁性材料的高频电磁性能,采用射频磁控溅射工艺制备了一系列FeCoB和FeCoNiB磁性薄膜。研究了Ni元素的引入对材料微结构和电磁性能的影响。结果表明,适量的Ni添加量有利于获得优良的微波电磁性能,这主要归因于B在晶粒边界的析出。制备的厚度约为200nm薄膜样品在GHz频段下同时具有高饱和磁化强度4πMs=2.212T,高铁磁共振频率fFMR=3.16GHz,较高的电阻率ρ=276μΩ.cm,其磁导率实部μ'在0.5～2.9GHz频率范围内>200。该薄膜可应用于GHz频段下电磁器件的设计中。

To develop magnetic materials with high-frequency electromagnetic characteristics,a series of FeCoB and FeCoNiB thin films were synthesized by RF magnetron sputtering.Effects of the Ni addition to FeCoB system on microstructure and electromagnetic characteristics were investigated.It is found that appropriate increment of Ni content is of advantage to the high-frequency characteristics,resulting from the B segregation on grain boundaries,the FeCoNiB films with a thickness of 200nm exhibited 4πMs of 2.212T,fFMR of 3.16GHz,ρ of 276μΩ·cm,and μ′ is larger than 200 in the 0.5-2.9GHz,these results show that the presented films have potential for the electromagnetic device design in the GHz frequency range.