飞秒激光烧蚀制备纳米结构ITO薄膜

Fabrication nanostructure on ITO films by femtosecond laser ablation

利用飞秒激光烧蚀ITO与ZnO双层薄膜的方法,制备具有大面积表面纳米结构的ITO薄膜。在激光频率1kHz、脉冲宽度130fs、波长775nm、能量20μJ时,在ITO薄膜表面,获得了大面积的周期为176nm左右的周期性平行条纹结构。通过改变激光能量,研究了大面积纳米结构与激光能量之间的关系,发现这种大面积纳米结构是在激光能量小于材料烧蚀阈值的条件下形成的。

An ITO films with large area surface nano-structure was prepared by femtosecond laser ablating a double-layer of ITO and ZnO films with the femtosecond laser frequency of 1kHz,pulse width of 130fs,wavelength of 775nm and energy of 20μJ.ITO film and ZnO film were obtained by magnetron sputtering and ZnO film is on the top as a buffer layer.Nano-structure is a period parallel stripes structure with a period of 176nm.Through the researching of the results induced by femtosecond laser with different energy,the relationship between the formed structure and laser energy is studying.It founded that the large area surface nano-structure is induced at the condition of laser energy less than the materials ablation threshold energy.