摘要
采用化学溶液分解法(CSD)在p型Si<100>衬底上制备了(Bi0.8Ce0.2)2Ti2O7薄膜,采用X射线衍射技术研究了薄膜的结构和结晶性。研究表明:Ce3+部分取代Bi3+能够显著提高Bi2Ti2O7薄膜的相稳定性。同时还研究了薄膜的电容-电压特性、介电常数、介电损耗。结果表明,该薄膜具有良好的介电特性。
(Bi0.8Ce0.2)2Ti2O7 thin films were grown on p-Si100 substrates by chemical solution decomposition method.The structure and crystallization characteristics of the films were studied by X-ray diffraction(XRD).It is indicated that if Bi ions are partly substituted by Ce ions,the phase stability of Bi2Ti2O7 would be improved evidently.Capacitance-voltage properties,dielectric constants and dielectric loss of the thin films were studied.The results show that the prepared(Bi0.8Ce0.2)2Ti2O7 thin films have good dielectric properties.
出处
《人工晶体学报》
EI
CAS
CSCD
北大核心
2010年第6期1372-1375,1380,共5页
Journal of Synthetic Crystals
基金
国家自然科学基金(50721002
10774091)资助项目
国家重点基础研究发展计划(973)(2007CB613302)资助项目