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沉积温度对BiFeO_3薄膜结构和性能的影响 被引量：3

Effect of Deposition Temperature on the Structure and Properties of BiFeO_3 Film
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摘要 采用磁控溅射法制备SrRuO3(SRO)薄膜、脉冲激光沉积法制备BiFeO3(BFO),构架了Pt/SRO/BFO/SRO/SrTiO3(001)异质结,采用X射线衍射仪(XRD)、铁电测试仪研究了沉积温度对BFO薄膜结构和性能的影响。研究结果表明,随着温度的升高,BFO(001)和(002)衍射峰强度逐渐增强,BFO(110)和Bi2O3衍射峰强度逐渐减小,不同沉积温度下生长的样品都具有铁电性,在800 kV/cm的电场下,640℃下生长的BFO薄膜的剩余极化强度为65μC/cm2。采用数学拟合的方法研究了Pt/SrRuO3/BiFeO3/SrRuO3/SrTiO3的漏电机理,结果表明BFO薄膜导电机理为普尔-弗兰克导电机理。 Pt/SrRuO3（SRO）/BiFeO3（BFO）/SRO/SrTiO3 heterostructure had been fabricated on SrTiO3（001） substrate,in which SRO and BFO thin films were deposited by RF magnetron sputtering and pulsed laser deposition,respectively.The effect of deposition temperature on the structural and properties of BFO thin film were investigated by X-ray diffraction（XRD） and a ferroelectric tester.It is found that as deposition temperature increasing,the intensities of BFO（001） and（002） peaks increase gradually,while BFO（110） and Bi2O3 peaks decrease.BFO films deposited at different temperatures possess saturated hysteresis loops.The remanent polarization of the BFO film prepared at 640 ℃ is 65 μC/cm2,which is measured at the electric field of 800 kV/cm.The leakage conduction mechanism of BFO film was investigated,and it was found that the Poole-Frenkel emission is dominant conduction mechanism.
作者 赵庆勋 魏大勇 王宽冒 马继奎 刘保亭 王英龙
机构地区 河北大学物理科学与技术学院
出处 《人工晶体学报》 EI CAS CSCD 北大核心 2010年第6期1396-1400,共5页 Journal of Synthetic Crystals
基金 国家自然科学基金(60876055 11074063 10774036)资助项目 河北省自然科学基金(E2008000620 E2009000207 E2008000631)资助项目 河北省应用基础研究计划重点项目(10963525D) 高等学校博士点基金(20091301110002)资助项目
关键词 脉冲激光沉积 沉积温度 铁酸铋薄膜 pulsed laser deposition deposition temperature BiFeO3 film
分类号 O484 [理学—固体物理]
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参考文献13

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二级参考文献30

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共引文献19

同被引文献108

  • 1郭延龙,王小兵,万强,卢常勇.超快脉冲激光沉积类金刚石膜的研究进展[J].激光与光电子学进展,2005,42(7):22-25. 被引量：10
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引证文献3

二级引证文献20

人工晶体学报
2010年 第6期

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