摘要
从大角度离子注入机束线系统设计上的改进出发,对加/减速模式和多电荷注入等情况下的束能量纯度控制进行了阐叙,同时依靠大量的实验,从SIMS的实验数据来验证控制设计的合理性和有效性。
This paper starts off improving on the design of the beamline system of the large tilt ion implanter,describes in detail the beam energy purity control for accel/decal model and multiply charged implanting.Simultaneity we depend on large numbers of experiments,from SIMS experiment data to validate control design that is rationality and validity.
出处
《电子工业专用设备》
2011年第1期21-23,共3页
Equipment for Electronic Products Manufacturing
