对羟基苯甲酸自组装膜对铜的缓蚀作用

Inhibition Action of the Self-Assembled Monolayers of P-hydroxybenzoic Acid on Copper

利用自组装技术将对羟基苯甲酸在铜表面形成自组装单分子膜,利用电化学阻抗谱和极化曲线研究了自组装膜对铜的缓蚀作用及其吸附行为。结果表明,对羟基苯甲酸分子易在铜表面形成稳定的自组装单分子膜,该膜抑制了铜的阳极氧化过程,改变了电极表面的双电层结构,固/液界面双电层电容明显降低,有良好的缓蚀效果。研究结果还表明,对羟基苯甲酸在铜表面的吸附行为符合Langmuir吸附等温式,吸附机理是典型的物理吸附。

The anticorrosion and inhibiting mechanism for the self-assembled monolayers（SAMs） of p-hydroxybenzoic acid on the surface of copper electrode were investigated by electrochemical method,as well as its adsorption behavior.The results indicated that p-hydroxybenzoic acid was liable to interact with copper forming SAMs on the surface of copper.The SAMs changed the structure of the electric-double layer.The SAMs restrained the process of anodic oxidation and had well anticorrosion effect.It was in good agreement with the results by EIS and polarization curve methods.The results form electrochemical measurements indicated that the corrosion resistance for copper electrode was improved by the p-hydroxybenzoic acid SAMs.Adsorption of the SAMs was found to follow the Langmuir＇s adsorption isotherm,and the adsorption mechanism was typical physisorption.