磁控溅射TiAlVN薄膜中V含量对其结构和抗腐蚀性能的影响

Effect of V Content on Structure and Corrosion Resistance of Magnetron Sputtered TiAlVN Film

向TiAlN薄膜中添加V可改善薄膜性能。采用磁控溅射技术沉积了不同V含量的TiAlVN薄膜,通过能谱仪、台阶仪、X射线衍射仪(XRD)和原子力显微镜(AFM)分析薄膜的成分、厚度、相结构和表面形貌,用动电位极化的方法研究薄膜的抗腐蚀性能。结果表明:TiAlVN薄膜属于面心立方(fcc)和六方密排(hcp)二重结构,晶格常量比TiAlN薄膜小,晶粒尺寸比TiAlN薄膜大,含V10.20%的TiAlVN薄膜质量相对较好;TiAlVN薄膜的腐蚀电流明显小于TiAlN薄膜,抗腐蚀性能增强,含V 10.20%的TiAlVN薄膜的抗腐蚀性能约为TiAlN薄膜的4倍。

TiAlVN films with different V contents were deposited by magnetron sputtering.The composition,thickness,phase structure and morphology of as-deposited films were analyzed using an energy dispersive spectrometer,a step profiler,an X-ray diffractometer and an atomic force microscope.The corrosion resistance of the films was evaluated by potentiodynamic polarization method.Results indicate that as-deposited TiAlVN films have face-centered cubic(fcc) and hexagonal close-packed(hcp) dual-phase structure,showing smaller lattice parameters and larger grain size than the TiAlN film.In the meantime,TiAlVN films had much smaller corrosion current and stronger corrosion resistance than the TiAlN film,and the corrosion resistance of the TiAlVN film containing 10.20% V was four times as good as the TiAlN film.