高反射光学薄膜的温度稳定性分析

Temperature Stability of Highly Reflective Coating

利用高桥模型讨论了高反射光学薄膜的温度稳定性问题,理论上着重分析了高反射膜主反射光谱带边缘线性区域波长位置处反射率温度系数以及膜料和基底热物理参数对它的影响,得出该系数正比于膜料的热物理参数,而反比于基底的线性热膨胀系数。对于文中分析的样品,其温度稳定性受高折射率材料的折射率温度系数影响最大。

The analysis on the temperature stability of the HR （highly reflective） coating by Takahashi model is presented. A theory is developed to describe the temperature coefficient of re-flectivity dependence on the thermo-physical properties of the substrate and coating materials. It is found that the temperature coefficient of reflectivity at the edge of the main reflection band of the HR coating is linearly proportional to the thermo-physical properties of the coatings, and in-versely proportional to the linear thermal expansion coefficients of the substrate. Meanwhile, the temperature coefficient of the refractive index of the H layer has a prominent contribution to the temperature dependence of the reflectivity of the HR coating for our studied sample.