期刊文献+

压焊点底下介质容抗对HBT高频性能影响

Impact of Capacitive Dielectric Material under the Pads on High-Frequency Characteristics in HBTs
下载PDF
导出
摘要 在对采用了同一流片相同制备工艺制得的两个异质结双极晶体管(HBT)高频特性实验测量数据分析比较的基础上,探讨了压焊点(Pad)底下介质容抗对HBT高频性能的影响,结论表明:Pad底下的介质容抗对HBT的高频性能影响比较明显,且高频段[-20dB/decade]直线外推fT、fMAX的规律由于介质容抗的存在会造成较大的误差可不再有效,因而等效电路模型需作相应的修正。 Based on the analysis to the measured data for the high-frequency characteristics of two heterojunction bipolar transistors(HBTs) with the same fabricated process,the influence of capacitive dielectric material under the Pads on the high-frequency characteristics in HBTs has been investigated.The conclusion is made that the capacitive reactance of dielectric material under Pads can have great impacts on the RF performance of HBTs,which should be taken into account to the HBT equivalent circuit modeling,and that the extrapolate rule for fT,fMAX of the –20dB/decade extending line may have enough erroneous because of the capacitive reactance of the dielectric material under Pads.
出处 《传感技术学报》 CAS CSCD 北大核心 2010年第12期1728-1730,共3页 Chinese Journal of Sensors and Actuators
基金 武汉大学测绘遥感信息工程国家重点实验室开放课题资助(08重03)
关键词 HBT 压焊点 容抗 高频特性 HBTs pads capacitive reactance high-frequency performance
  • 相关文献

参考文献11

  • 1Kim H S,Kim H J,Hong S E,et al.Fabrication and Characteristics of an InP Single HBT and Waveguide PD on Double Stacked Layers for an OEMMIC[J].ETRI Journal,2004(1):61-64.
  • 2杨维明,史辰,谢万波,吴楠,陈建新.基于高电阻率衬底的Si/SiGe HBT(英文)[J].功能材料与器件学报,2006,12(6):541-545. 被引量:1
  • 3Lee Q,Martin S C,Mensa D,et al.Submicron Transferred Substrate Heterojunction Bipolar Transistors[J].IEEE Electron Device Letters,1999(8):396-398.
  • 4DAI Guang-hao WANG Sheng-rong LI Wen-jie.Improvement on Frequency Performance of SOI SiGe HBT[J].Semiconductor Photonics and Technology,2006,12(3):150-152. 被引量:1
  • 5Huang Wei kuo,Huang Shou chian,Chung Hsiao wen,et al.37 GHz Bandwidth Monolithically Integrated InP HBT/Evanescently Coupled Photodiode[J].IEEE Photonics Tech Lett,2006(12):1323-1325.
  • 6苏树兵,刘新宇,徐安怀,于进勇,齐鸣,刘训春,王润梅.MBE生长的InP DHBT的性能(英文)[J].Journal of Semiconductors,2006,27(5):792-795. 被引量:1
  • 7李献杰,曾庆明,徐晓春,刘伟吉,敖金平,王全树,杨树人,赵方海,柯锡明,王志功,刘式墉,梁春广.1.55μm光发射OEIC技术研究[J].半导体光电,2002,23(1):23-25. 被引量:1
  • 8Chen Tzu Pin,Lee Chi Jhung,Lour Wen Shiung,et al.On the Breakdown Behaviors of InP/InGaAs Based Heterojunction Bipolar Transistors (HBTs)[J].Solid State Electronics,2009(2):190-194.
  • 9Harker S D,Havens R J,Paasschens J C J,et al.An S Parameter Technique for Substrate Resistance Characterization of RF Bipolar Transistors[J].IEEE Bctm,2000(10):176-179.
  • 10Lee J M,Min B G,Kim S I,et al.Fabrication and Temperature Dependent Characteristics of AlGaAs/GaAs Heterojunction Bipolar Transistors with an AlGaAs Ledge Structure[J].Journal of the Korean Physical Society,2002(2):320-324.

二级参考文献35

  • 1徐安怀,邹璐,陈晓杰,齐鸣.InGaAs/InP HBT材料的GSMBE生长及其特性研究[J].稀有金属,2004,28(3):516-518. 被引量:5
  • 2杨维明,陈建新,史辰,李振国,高铭洁.基于小信号等效电路模型的SiGe HBT高频特性模拟分析[J].微电子学,2005,35(1):1-4. 被引量:5
  • 3[1]Umbach A, Engel T, Bach H G, et al. Technology of InP-based 1.55μm ultrafast OEMMICs: 40Gbit/s broadband and 38160GHz narrowband photoreceivers[J]. IEEE J. Quan. Electron., 1999, 35(7): 1024.
  • 4[2]Huber D, Bitter M, Morf T, et al. A 46GHz bandwidth monolithic InP/InGaAs pin/SHBT photoreceiver[J]. Electron. Lett., 1999, 35(1): 40-41.
  • 5[3]Liou K Y, Chandrasekhar S, Dentai A G, et al. A 5Gb/s monolithically integrated light wave transmitter with 1.5μm MWQ laser and HBT driver circuits[J]. IEEE Photon. Technol. Lett., 1991, 3(10):928.
  • 6[4]Willen B, Eriksson U, Evaldsson P, et al. InP HBT technology for high speed circuits and OEICs[A]. International Conf. on Indium and Related Materials[C]. 1997. 629-632.
  • 7Hattcndorf M L. Submicron scaling in indium phosphide indium gallium arsenide single heterojunction bipolar transistors. PhD Dissertation, University of Illinois at Urbana-Champaign ,2002
  • 8Yu D, Lee K, Kim B, et al. Ultra high-speed InP/InGaAs SHBTs with fmax of 478GHz. IEEE Electron Device Lett,2003,24(6) :384
  • 9Hafez W,Lai J W,Feng M. InP/InGaAs SHBTs with 75nm collector and ft > 500G Hz. Electron Lett, 2003,39 (20) : 1475
  • 10Feng M. InP set to break the speed limit. Compound Semiconductor,2005,11 ( 1 ) : 18

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部