摘要
A new EIPIG (Electron Injected-Penning Ionization Gauge) ion source is now under developing in IMP. This source aims to produce high intensity metallic ions of 2-3 charge state. To satisfy this requirement, we introduced some innovations based on typical hot cathode penning source in the design of EIPIG, such as injecting electron into the plasma, which increases the density of electrons in the plasma and enhances
A new EIPIG （Electron Injected-Penning Ionization Gauge） ion source is now under developing in IMP. This source aims to produce high intensity metallic ions of 2-3 charge state. To satisfy this requirement, we introduced some innovations based on typical hot cathode penning source in the design of EIPIG, such as injecting electron into the plasma, which increases the density of electrons in the plasma and enhances PIG effect, improvement on cooling cathode and appliance of LaBs hollow cathode, which prolong the life of the cathode and the anti-cathode, the electric and magnetic confinement is adopted to confine the plasma,
