摘要
用射频磁控溅射法在Pt/Ti/SiO2/Si(100)结构衬底上沉积了高度C轴取向La改性的PbTiO3(PLT15)薄膜.研究了PLT15薄膜的电晕极化方法,用此方法同时对多个热释电敏感单元进行了极化.利用PLT15薄膜制备了热释电红外传感器,薄膜厚度是2μm,真空蒸发的Ni-Cr电极面积为1.2mm×1.0mm,敏感元下的Si(100)基片用热KOH和EPW进行刻蚀.用所设计的热释电系数测试系统对PLT15薄膜样品进行了测试,研究了其热释电特性.测试结果表明,PLT15薄膜样品的热释电电流ip平均为2.1×10-11A,而对应的热释电系数p为2.52×10-8C·(cm2·K)-1.
C axis mostly oriented and La modified PbTiO 3 (PLT15) thin films are
deposited on the substrate with Pt/Ti/SiO 2/Si(100) structure by rf magnetron sputtering.
Corona poling is investigated on the PLT15 thin films and a number of pyroelectric sensing
cells of the PLT15 thin films are polarized by the use of corona poling method at the same time.
Pyroelectric infrared (IR) sensors are fabricated by using the PLT15 films, the thickness of the
films is 2 μm, the area of Ni Cr electrode evaporated by vacuum is 1.2 mm×1.0 mm, and the
Si (100) substrate under sensing cell area is etched off by heated KOH and EPW. The samples
of the PLT15 thin films have been measured. The results have shown that i p aver is 2.1
×10 -11 A and p is 2.52×10 -8 C·(cm 2·K) -1 for the samples of the thin films.
The thin films are the most suitable materials for IR sensors.
出处
《华中理工大学学报》
CSCD
北大核心
1999年第6期7-9,共3页
Journal of Huazhong University of Science and Technology
基金
国家高技术研究发展计划资助
关键词
射频磁控溅射
热释电性
红外传感器
铁电薄膜
rf magnetron
sputtering
thin fims
pyroelectric characteristics
infrared sensors