摘要
以反式２丁烯为工作气体，采用低压等离子体化学气相沉积法制备 Ｃｘ Ｈ１－ ｘ薄膜。研究了在不同的 Ｈ２ 与反式２丁烯流量比下制备的 Ｃｘ Ｈ１－ ｘ薄膜的傅里叶变换红外光谱（ Ｆ Ｔ Ｉ Ｒ）及 Ｘ Ｐ Ｓ谱的特性。初步探讨了 Ｃｘ Ｈ１－ ｘ的生长机理。膜中ｓｐ３ 杂化碳原子和ｓｐ２ 杂化碳原子的数量以及两者的比例与沉积条件有关。
The C x H 1- x film are prepared using low pressure plasma CVD with trans 2 butene.The Fourier transform infrared spectroscopy (FT IR) and XPS spectra of C x H 1- x film prepared at various flow ratio between H 2 and trans 2 butene are studied.The growth mechanism of C x H 1- x film is briefly discussed.The production rate of sp 3 carbon and sp 2 carbon is related with the deposition condition.
出处
《原子能科学技术》
EI
CAS
CSCD
北大核心
1999年第4期319-322,共4页
Atomic Energy Science and Technology
