硼靶制备技术的研究

THE PREPARATION OF BORON TARGETS

介绍 Ｂ靶制备技术及其质量厚度测量方法。静电振动、高压电喷和离心沉淀主要用于制备有衬 Ｂ靶，而聚焦重离子束溅射和电子轰击可用来制备自支撑 Ｂ靶和有衬 Ｂ靶。 Ｂ靶的质量厚度用分光光度法和称重法测量。

The methods of producing boron films on backings by centrifugal precipitation,electrospraying and electricity vibration are presented. Techniques for preparing self supporting B targets between 0 045 and 0 45 mg/cm 2 from isotopic boron by electron bombardment or focused ion beam sputtering are discussed. Microscope slides coated with betaine or Ni plates are used as substrates from which strong B foils with little residual stress are floated. A spectrophotometer has been used to measure the mass thickness of B targets prepared by electron bombardment.