磁控溅射TiAlN和WTiN薄膜的制备与摩擦性能研究

Preparation of TiAlN and WTiN thin films by magnetron sputtering and their tribological performance

采用双靶反应磁控溅射的方法在40Cr基体上制备了TiAlN薄膜和WTiN薄膜。用XRD,SEM,AFM等检测手段对薄膜的表面状态及结构等进行了表征,采用UMT-3型多功能摩擦试验机,在室温、大气环境、无润滑的条件下对TiAlN和WTiN薄膜的摩擦性能进行了评价。实验结果表明:TiAlN薄膜出现了两种硬质相TiN与TiAlN共存的物相结构,而WTiN薄膜出现了TiN0.6O0.4,TiN,W2N,WN等多种物相结构;制备的TiAlN、WTiN薄膜表面晶粒均匀细小,生长均以粒状结构为主;摩擦实验数据表明制备的TiAlN和WTiN薄膜均拥有良好的摩擦性能。

TiAlN and WTiN thin films were deposited with double-target reactive magnetron co-sputtering on 40Cr steel substrate.XRD,SEM and AFM were used to characterize the composition,roughness and microstructure of the films.Tribological performance of the films was tested on UMT-3 multifunctional tribometer in atmosphere at room temperature without lubricant.The results showed that after heat-treatment at 800℃/1h,the two hard phases TiN and TiAlN coexist in TiAlN film,while the TiN0.6O0.4,TiN,W2N and WN phases form in WTiN film,and all of the phases grow mainly in granular structure.The surface grain sizes of both TiAlN and WTiN films are uniform and fine.Friction tests indicated that both TiAlN and WTiN films are excellent at tribological performance.