摘要
考察不同沉积时间的金属铝与铜的薄膜的沉积态,电阻变化与厚度,厚度测量采用实验室光学干涉和透过率对比方法。金相显微与铝铜电阻变化的测量表明,不连续薄膜与连续过渡之间,电阻显著变化处不同,铝膜电阻随时间变化过程开始时存在波动状态。
It was investigated for states of metal aluminum and copper films deposited in different time,their resistance properties and thickness.The films＇ thickness was measured on normal methods of optical interference and intensity-transmittance.By optical microscopic structure inspected and resistance measured,the result showed the resistance obvious change by thickness which is noncontinuous to continuous film,and difference by metal film composition.Especially,Al films＇ resistance was showed some fluctuation on begin along with measure time.
出处
《大学物理实验》
2011年第1期1-4,共4页
Physical Experiment of College
关键词
薄膜生长
薄膜电阻
薄膜测量
the growth of thin films
thin-film resistance
film measurements
