摘要
利用光谱型椭偏仪测量了镀在熔石英玻璃基片上的氟化镁薄膜在300~850 nm波长范围内的椭偏参数,并利用Levenberg-Marquardt算法,反演出了氟化镁薄膜在该波长范围内的色散曲线。通过与纯氟化镁体材料的色散曲线比较,发现所镀的氟化镁薄膜的折射率略小于体材料的折射率。
The ellipsometric parameters of MgF2 films in the wavelength range of 300nm^850nm on fused silica are measured by spectroscopic ellipsometer.The dispersion curve of the films is acquired by Levenberg-Marquardt arithmetic.The results show that the refraction index of the films is smaller than that of the bulk materials.
出处
《大学物理实验》
2011年第1期11-13,共3页
Physical Experiment of College
关键词
椭偏测量
光学薄膜
色散曲线
反演
ellipsometry
optical film
dispersion curve
inversion
