单晶MgO抛光基片表面吸湿潮解变化研究

Research on Moisture Absorption and Deliquescence Behavior of Single Crystal MgO Polishing Substrate

将制备好的单晶氧化镁(MgO)抛光基片分别置于空气、干燥箱和真空环境中,采用光学显微镜、3D表面轮廓仪及X射线光电子能谱仪研究基片表面的吸湿潮解变化。通过研究发现,单晶氧化镁(MgO)抛光基片的吸湿潮解行为会严重破坏晶体结构,影响表面质量。在不同的环境下,吸湿潮解行为对表面的破坏程度是不一样的。

In order to study the moisture absorption and deliquescence behavior of single crystal MgO polishing substrates,they are placed in air,hothouse and vacuum circumstance respectively.Within certain time,their surface profile changes are observed by the optic microscope,their surface roughness changes are observed by the 3D surface profilometer,and their surface component changes are analyzed by the XPS measurement.It is found that the moisture absorption and deliquescence behavior of single crystal MgO polishing substrate seriously destroys the crystal＇s configuration,and affects its surface quality.In different circumstances,the destroy extent to the surface by moisture absorption and deliquescence behavior is different.