摘要
介绍 Ｈ Ｌ－ １ Ｍ 托卡马克装置的壁处理技术。使用氦辉光放电清洗清除装置杂质和降低壁中氢含量，壁硼化和硅化技术以及原位沉积膜的原位清除。
The advanced methods of in-situ wall coating adopted in Hl-1M tokamak were presented. The impurity and hydrogen in the inner walls of fusion device were decreased by means of glow discharge conditioning with helium(HeGDC).In-situ boronization and siliconization and removal of the coating film were introduced.
出处
《真空与低温》
1999年第3期144-147,156,共5页
Vacuum and Cryogenics
