Ti表面高承载摩擦学SiC薄膜的研究

An Investigation on tribological SiC films on titanium under high loads

采用室温磁控溅射技术在金属钛表面制备出碳化硅（SiC）薄膜。研究了SiC薄膜的组织结构、纳米压痕行为和摩擦磨损性能。实验结果表明：SiC薄膜呈非晶态,含有较多Si-C键;膜-基间结合很好,具有明显的且呈梯度的相互元素扩散;薄膜的硬度（H）为12.1 GPa,杨氏弹性模量（E）为166.2 GPa,硬度与弹性模量比值（H/E）为0.073;在以氮化硅球为对摩件,初始Hertzian接触应力约为685~930 MPa的室温Kokubo人体模拟体液条件下,其磨损速率在10-5 mm3/Nm级,摩擦系数约为0.215,且不出现薄膜的破裂及剥落现象。分析表明,该薄膜在高载荷下仍具有很好的摩擦磨损性能,其原因是薄膜具有高的韧性和很好的界面结合;高的韧性与H及H/E相对较低有关,而好的界面结合与膜-基间弹性模量的差值较小有关。

The microstructure,nano-indentation and friction /wear properties of SiC films deposited on titanium（TA2）substrate using magnetron sputtering at room temperature were investigated.The results show that the SiC films were amorphous and contained high amounts of Si-C bonds.The interface adhesion was excellent,with large and gradual element diffusions.The films displayed a lower hardness（12.1 GPa）,a lower modulus（166.2 GPa）and a lower ratio of hardness-to-modulus（0.073）.As sliding against Si3N4（silicon nitride）at the initial Hertzian pressure of approximately 685~930 MPa at room temperature under Kokubo simulation body fluid（SBF）condition,the films exhibited the friction coefficient of about 0.215 and the special wear rate of about 10-5 mm3/Nm together with no interface delaminating and film cracking.The good wear-resistance was owing to the high toughness of the films and the good interface bonding.The high toughness was correlated with the lower hardness and the lower ratio of hardness-to-modulus.The good interface bonding was correlated with the good film/substrate modulus match.