摘要
影响钼栅网电解加工尺寸均一性的因素有电解液浓度、电流密度、阴极直径以及极间间隙等。利用Taguchi方法对这些因素进行综合分析及试验验证,阴极直径和极间间隙作用显著。通过ANSYS软件对电解过程中的电场进行分析,得出了阴极直径和极间间隙大小的改变对阳极表面电场的影响规律。在此基础上,采用酸性活化电解液对钼栅网进行微细光刻电解加工,取得了较好的试验结果。
Electrolyte concentration,current density,design of cathode and interelectrode gap are the main factors of electrolytic photo etching process,especially for achieving the dimensional uniformity of molybdenum grids.In this paper,the Taguchi method is introduced to establish analytical and experimental procedure.It is demonstrated that the diameter of cathode and interelectrode gap are more remarkable amongst those influence factors,and the discipline of the electric field of interelectrode gap is analyzed by using ANSYS platform.On this basis,the molybdenum grids are successfully fabricated by using electrolytic photo etching with acidic and activated electrolyte.
出处
《电加工与模具》
2011年第1期11-14,共4页
Electromachining & Mould
关键词
光刻电解
Taguchi方法
电场分析
钼栅网
electrolytic photo etching
Taguchi method
analysis of electric field
molybdenum grid
