摘要
We report fabrication and characterization of metal-semiconductor-metal photoconductive detectors based on Al-doped ZnO thin films fabricated by radio frequency magnetron sputtering.Optical and structural properties of the thin films were characterized using various techniques.At 6 V bias,a responsivity higher than 4 A/W in the wavelength shorter than 350 nm was obtained,and this responsibility dropped quickly and reached the noise floor in the visible region.Transient response measurement revealed that the detector had a fast photoresponse with a rise time of 9 ns and a fall time of 1.2 μs.
We report fabrication and characterization of metal-semiconductor-metal photoconductive detectors based on Al-doped ZnO thin films fabricated by radio frequency magnetron sputtering.Optical and structural properties of the thin films were characterized using various techniques.At 6 V bias,a responsivity higher than 4 A/W in the wavelength shorter than 350 nm was obtained,and this responsibility dropped quickly and reached the noise floor in the visible region.Transient response measurement revealed that the detector had a fast photoresponse with a rise time of 9 ns and a fall time of 1.2 μs.
基金
supported by the National Natural Science Foundation of China (Grant No.50972007)
the Beijing Municipal Natural Science Foundation (Grant No.4092035)
the State Key Program for Basic Research of the Ministry of Science and Technology of China (Grant No.2011CB932703)
the Special Items Fund of Beijing Municipal Commission of Education
the Opened Fund of State Key Laboratory on Integrated Optoelectronics
the National Science Fund for Distinguished Young Scholars (Grant No.60825407)
