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High Nitrogen Pressure Solution (HNPS) growth of GaN on 2 inch free standing GaN substrates 被引量:2

High Nitrogen Pressure Solution (HNPS) growth of GaN on 2 inch free standing GaN substrates
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摘要 Recent results of High Nitrogen Pressure Solution (HNPS) growth of GaN crystals deposited on and separated from 2 inch,and smaller,GaN substrates grown by Hydride Vapor Phase Epitaxy (HVPE) have been presented. The influence of the c-plane bowing in the initial substrate on quality,rate and mode of growth by HNPS method has been analyzed in details.
出处 《Science China(Technological Sciences)》 SCIE EI CAS 2011年第1期42-46,共5页 中国科学(技术科学英文版)
基金 supported by the European Union within European Regional Development Fund,through grant Innovative Economy (POIG.01.01.02-00-008/08)
关键词 High Nitrogen Pressure Solution (HNPS) growth seeded growth Hydride Vapor Phase Epitaxy (HVPE) growth 氮化镓晶体 生长 压溶 高氮 自由站 氢化物气相外延 基板 HVPE
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参考文献12

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