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Novel photoresist stripping technology using steam-water mixture

Novel photoresist stripping technology using steam-water mixture
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摘要 A novel wet vapor photoresist stripping technology is developed as an alternative to dry plasma ashing and wet stripping. Experiments using this technology to strip hard baked SU-8 photoresist, aurum and chromium film are carried out. Then the images of stripping results are shown and the mechanism is analyzed and discussed. The most striking result of this experiment is that the spraying mixture of steam and water droplets can strip pho- toresist and even metal film with ease. A novel wet vapor photoresist stripping technology is developed as an alternative to dry plasma ashing and wet stripping. Experiments using this technology to strip hard baked SU-8 photoresist, aurum and chromium film are carried out. Then the images of stripping results are shown and the mechanism is analyzed and discussed. The most striking result of this experiment is that the spraying mixture of steam and water droplets can strip pho- toresist and even metal film with ease.
作者 王磊 惠瑜 高超群 景玉鹏
机构地区 Microelectronic Equipment Technology DepartmentInstitute of Microelectronics
出处 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2011年第2期142-148,共7页 半导体学报（英文版）
基金 Project supported by the National Natural Science Foundation of China(No.60976017)
关键词 photoresist stripping plasma ash wet stripping steam-water mixture jet spray photoresist stripping plasma ash wet stripping steam-water mixture jet spray
分类号 TN305.7 [电子电信—物理电子学]
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Journal of Semiconductors
2011年 第2期

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