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电解铜箔表面结构及性能影响因素 被引量:9

Surface structure and performance of electrolytic copper foils
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摘要 对铜箔进行化学处理,考察阴极钛辊表面粗糙度及阴极钛辊的腐蚀对铜箔的性能及表面图像影响。研究结果表明:增加处理液中Cu2+浓度及提高电流密度,有利于表面粗糙度增加,抗剥离强度增大,蚀刻因子Ef降低。若同时降低浸泡复合液中Cu2+和Zn2+浓度,增加Sb2+浓度,则表面粗糙度及抗剥离强度降低,蚀刻因子增加;复合液中Sb2+浓度增加也能使表面粗糙度增加,蚀刻因子增加,但是,抗剥离强度基本没有变化。添加CuSO4后,阴极钛辊腐蚀速度下降,当CuSO4质量浓度达到20 g/L后,钛的耐腐蚀速度在0.050 mm/a以下;当钛辊表面粗糙度Rz降低时,电解铜箔表面相对平整,晶粒大小较均匀,排列较规则。 Effects of surface roughness and erosion of titanium cathode drum on performance of electrolytic copper foils and surface images were studied by chemical treatments.The results show that surface roughness and contradict debonding intensity increases and etch factorial(Ef) decreases with the increase of copper concentration and electric current density.When the concentration of copper and zinc of leached compound solution decreases,surface roughness and contradict debonding intensity decreases but etch factorial(Ef) increases.When the concentration of Sb2+ of leached compound solution increases,surface roughness and contradict debonding intensity increases but etch factorial(Ef) has litter change.The erosion rate of titanium cathode drum decreases when CuSO4 is added.When the mass concentration of CuSO4 is added up to 20 g/L,the erosion rate is less than 0.050 mm/a.Moreover,the surface of electrolytic copper foils is even and the size is well-proportioned and ranks regularly when surface roughness of titanium cathode drum(Rz) decreases.
出处 《中南大学学报(自然科学版)》 EI CAS CSCD 北大核心 2010年第6期2162-2166,共5页 Journal of Central South University:Science and Technology
基金 国家科技支撑计划项目(2007BAB22B002)
关键词 电解铜箔 化学处理 表面粗糙度 腐蚀 electrolytic copper foils chemical treatment surface roughness corrosion
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参考文献15

  • 1Bockris J O M,Reddy A K N,Gamboa-Aldeco M.Modern electrochemistry seconded[M].New York:Kluwer Academic,2000:10-12,66.
  • 2Schlesinger M,Paunovac M.Modern electroplating[M].New York:Wiley,2000:47-52.
  • 3陈平华.电解铜箔市场研究报告[J].世界有色金属,2005(5):19-27. 被引量:5
  • 4韩明臣.钛合金的焊缝组织[J].稀有金属快报,2003,22(12):23-24. 被引量:6
  • 5任连保,吴丕杰,宋文君,刘红,孙文斌,马余选.电解铜箔用钛焊接阴极辊焊缝均晶化处理工艺研究[J].稀有金属快报,2007,26(9):39-42. 被引量:5
  • 6黄洁.铜箔的生产技术及发展趋向[J].铜业工程,2003(2):83-84. 被引量:24
  • 7Changa H K,Choeb B H,Lee J K.Influence of titanium oxide films on copper nucleation during electrodeposition[J].Materials Science and Engineering A,2005,409(1/2):317-328.
  • 8Seol K W,Choe B H,Lee Y K,et al.Effect of metals on the mechanical properties of copper[J].Mater Sci Forum,2003,426/432:3715.
  • 9Choe B H,Seol K W,Jeannette J A,et al.Copper electrochemistry and electrodeposition[C] //LiMAT-2003.Pohang:Postech,2004:237.
  • 10Grosgogeat B,Reclaru L,Lissac M,et al.Measurement and evaluation of galvanic corrosion between titanium/Ti6Al4V implants and dental alloys by electrochemical techniques and auger spectrometry[J].Biomaterials,1999(20):933-938.

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