TiN薄膜的制备及其纳米力学性能研究

Preparation of TiN films and their nano-mechanical properties

采用磁控溅射工艺制备了TiN薄膜,借助X射线衍射仪、场发射扫描电子显微镜、原子力显微镜和纳米压痕仪等设备,研究了薄膜制备工艺参数(如基体温度、溅射功率、基体负偏压等)对薄膜的相结构、表面微观形貌、纳米硬度、弹性模量等的影响。结果表明:TiN薄膜为多晶态,其溅射功率、基体负偏压和基体温度等条件对薄膜的形貌、结构及纳米硬度、弹性模量等的影响比较复杂。

Titanium nitride films were deposited on silicon by magnetron sputtering. The phase structures, surface morphology, nano-hardness, elastic modulus, residual stress of the films were investigated by X-ray diffraction （XRD）, field emission scanning electron microscopy （FESEM）, atomic force microscopy （AFM）, and nano-indentation instrument respectively. The influences of the preparation parameters, such as substrate temperature, sputtering power, substrate bias, on the properties of the films were discussed. The results show that the Titanium nitride films are polycrystalline and that the morphology, structure and performance of the films are determined by the sputtering power, substrate negative bias voltage and substrate temperature.