在真空等离子沉积中起弧和电弧稳定性问题研究

Research to the Stability and Triggering of Arc in the Process of Vacuum Plasma Deposition

在真空系统中,电弧的触发和稳定性受到很多因素的影响,如:阴极的材料、电极的结构、阴阳两电极之间的间隙、电极的表面状态、触发方式等。本文对于低真空状态下的电弧触发和稳定性问题作了探讨并提出了适合于本装置的较合理的参数。

In the near two years,we have renovated a vecuum heat treatment furnace into a vacuum deposition appara tus. According to our practical experimental experience,we have found that in vacuum system,triggering and stabil ity of arc are influenced by many factors such as the cathode material and structure,the gap between the cathode and anode,the surface situation,the breakdown mode of auxiliary electrode and etc. . In this paper,the problem of triggering and stability of arc in low vacuum were discussed and suitable parameters of this apparatus were put for ward.