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光刻过程RtR控制方法研究进展分析 被引量：1

Research Analysis of RtR Control Method for Lithography Process
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摘要 首先对光刻过程和RtR(Run-to-Run)控制技术的产生背景进行了介绍,对统计过程控制的不足进行了分析并给出了RtR控制器的一般结构。然后从过程建模和控制算法两个角度对三种主要的光刻过程RtR控制器EWMA,MPC和ANN进行了综述和评价,对这三种控制器在非线性控制、单变量控制、多变量控制的适用性和优化控制效果进行了比较分析。最后指出基于MPC的非线性多变量控制器将成为光刻过程RtR控制器的主要研究方向。 Firstly,the lithography process and background of RtR control technique were introduced.The shortage of statistical process control was analyzed and the general structure of the RtR controller was given.Then,an overview and evaluation about EWMA,MPC and ANN controllers of the lithography process were given in the ways of modeling and control algorithms.Besides,the comparative analysis of the nonlinear control,SISO control,MISO control,MIMO control and optimization control quality of three controllers were presented.Finally,it is proposed that the multivariable nonlinear controllers based on MPC become the future development direction of the lithography process RtR controller.
作者 王亮 胡静涛
机构地区 中国科学院沈阳自动化所工业信息学重点实验室 中国科学院研究生院 沈阳化工大学
出处 《半导体技术》 CAS CSCD 北大核心 2011年第3期199-205,共7页 Semiconductor Technology
基金 国家科技重大专项(2009ZX02001-005) 沈阳市科技计划资助项目(108155202200)
关键词 半导体制造 光刻过程 RtR控制 过程控制 模型预测控制 semiconductor manufacturing lithography process RtR control process control model predictive control
分类号 TN305.7 [电子电信—物理电子学]
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参考文献23

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共引文献1

同被引文献18

  • 1MARTINEZ V F, EDGAR T. Control of lithography in semiconductor manufacturing [ J]. IEEE Control Systems Magazine, 2006, 26 (6): 46-55.
  • 2LACHMAN-SHALEM S, GROSMAN B, LEWIN D R. Nonlinear modeling and multivariable control of photolithography [ J ]. IEEE Transactions on Semiconductor Manufacturing, 2002, 15 (3) : 310 - 322.
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  • 5JANAKIRAM M, GOERNITZ S. Real-time lithography registration, exposure, and focus control - a framework for success [ J ]. IEEE Transactions on Semiconductor Manufacturing, 2004, 17 (3):388-401.
  • 6WANG J, HE P Q, QIN S J, et al. Recursive least squares estimation for run-to-run control with metrology delay and its application to STI etch process [ J ]. IEEE Transactions on Semiconductor Manufacturing, 2005, 18 (2) : 309 -319.
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  • 10BODE C A, KO B S, EDGAR T F. Run-to-run control and performance monitoring of overlay in semiconductor manufacturing [ J]. Control Engineering Practice, 2004, 12 (7): 893 -900.

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半导体技术
2011年 第3期

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