脉冲磁控溅射法制备单斜相氧化铒涂层

Monoclinic phase of erbium oxide coatings fabricated by pulsed magnetron sputtering

用中频脉冲反应磁控溅射法,在溅射功率为78W,93W和124W以及衬底温度分别为室温,500℃及677℃下制备了氧化铒涂层.采用原子力显微镜、纳米压痕、X射线衍射和掠入射X射线衍射法研究了涂层的形貌、力学性能及物相结构.测量了涂层的电学性能.结果显示,脉冲磁控溅射沉积氧化铒涂层具有较高的沉积速率.实验制备得到了单斜相结构的氧化铒涂层.提高溅射功率时,沉积速率从28nm/min增大至68nm/min,涂层的结晶质量显著下降.提高衬底温度至500℃和677℃时,单斜相衍射峰强度下降.分析认为,较低的衬底温度和较高沉积速率有利于氧化铒涂层形成单斜相结构.涂层的硬度和弹性模量分别为11.9—15.7GPa和179—225GPa.室温至677℃制备的涂层均具有较高的电阻率,为(1.5—3.1)×1012Ω·cm,满足聚变堆包层绝缘涂层的应用要求.

Erbium oxide coatings were fabricated by midfrequency pulsed reactive magnetron sputtering by varying the deposition conditions with respect to the sputtering power from 78 W to 124 W and substrate temperature from room temperature to 677 ℃ . Atomic force microscopy,nanoindentation,X-ray diffraction and grazing incidence X-ray diffraction were used to investigate the coatings’surface morphology,mechanical properties and crystallization behaviors. Electrical properties of the coatings were also measured. Erbium oxide coatings fabricated by pulsed magnetron sputtering have high deposition rate,varying from 28 nm /min to 68nm /min. A monoclinic Er2 O3 phase is obtained in the coatings. The crystalline quality of the coatings decreases with the increasing of the sputtering power. The diffraction intensity of monoclinic phase decreases as the substrate temperature was increased from room temperature to 500 ℃ and 677 ℃ . It is believed that the high deposition rate and low substrate temperature could lead to the formation of the monoclinic Er2 O3 coatings. The hardness and elastic modulus of the coatings deposited at substrate temperatures from room temperature to 677 ℃ vary from 11. 9 GPa to 15. 7 GPa and from 179 GPa to 225 GPa,respectively. The coatings deposited from room temperature to 677℃ all have high resistivity,varying from 1. 5 × 1012 Ω·cm to 3. 1 × 1012 Ω·cm,meeting the requirements of the insulating coatings in application to fusion reactor.