水溶性CuPc旋涂转速及退火方式对蓝色有机电致发光器件性能的影响

Influence of spin-coating rate and annealing method of water-soluble CuPc on blue organic light-emitting devices performance

本文以Be(PP)2为发光层、水溶性酞菁铜(WS-CuPc)为空穴注入层、NPB为空穴传输层,制备了结构为ITO/WS-CuPc/NPB/Be(PP)2/LiF/Al的蓝色有机发光二极管(OLEDs).研究了WS-CuPc不同旋涂转速对器件性能的影响.并在WS-CuPc最佳旋涂转速的基础上,进一步研究了WS-CuPc薄膜不同退火方式对器件性能的影响.实验中,对WS-CuPc层采用了一种新的退火方式,即对ITO玻璃衬底先加热后旋涂WS-CuPc层,并与传统退火方式及不经过退火处理的器件性能进行了比较,通过原子力显微镜(AFM)分析了不同处理方式对WS-CuPc薄膜表面形貌的影响.实验结果发现:WS-CuPc的最佳旋涂转速为3000r/min.在最佳旋涂转速的基础上,对WS-CuPc薄膜采用新退火方式得到的薄膜粗糙度比较小,器件性能最好.

Investigated in this work are the effects of the spin-coating rate of water-soluble copper phthalocyanine （ WS-CuPc） and the annealing method of WS-CuPc films obtained at the optimal spin-coating rate on the performances of blue organic light-emitting devices （OLEDs）. The OLEDs,eack with a configuration of ITO /WS-CuPc /NPB /Be（ PP）2 /LiF /Al,are fabricated by using WS-CuPc as hole injection layer,NPB as hole transport layer and Be （ PP ）2 as emission layer separately. In our experiments,a new annealing method of WS-CuPc is used first for heating the ITO glass,and then for spin-coating the WS-CuPc. The performances of the device prepared with the new annealing method are compared with those of the devices prepared with the traditional annealing method or no annealing treatment. And the effects of different annealing treatments on the surface topography are analyzed by atomic force microscope （AFM）. The experimental results demonstrate that there exists an optimal spin-coating rate of WS-CuPc,about 3000 r /min. Based on the optimal spin-coating rate of WS-CuPc,the roughness of the film prepared with the new annealing method is lowest and the performances of the device are best.