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Hole effective mass in strained Si (111)

Hole effective mass in strained Si (111)
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摘要 The directional, averaged, and density-of-states effective masses of holes have been calculated for strained Si/(111)Si1-xGex. The results for the directional effective mass show that the effect of strain makes the constant energy surface of "heavy" holes more obvious warping than that in relaxed Si. The [111] and [110] directional effective masses of "heavy" holes decrease significantly under strain. It is found that the averaged effective mass of "heavy" holes decreases with increasing Ge fraction, while that of "light" holes increases. The traditional concepts of heavy and light holes become insignificant when Ge fraction is close to 0.4. The strain effect monotonically reduces the density-of-states effective mass at 218, 300 and 393 K, respectively. The directional, averaged, and density-of-states effective masses of holes have been calculated for strained Si/(111)Si1-xGex. The results for the directional effective mass show that the effect of strain makes the constant energy surface of “heavy” holes more obvious warping than that in relaxed Si. The [111] and [110] directional effective masses of “heavy” holes decrease significantly under strain. It is found that the averaged effective mass of “heavy” holes decreases with increasing Ge fraction, while that of “light” holes increases. The traditional concepts of heavy and light holes become insignificant when Ge fraction is close to 0.4. The strain effect monotonically reduces the density-of-states effective mass at 218, 300 and 393 K, respectively.
出处 《Science China(Physics,Mechanics & Astronomy)》 SCIE EI CAS 2011年第3期450-452,共3页 中国科学:物理学、力学、天文学(英文版)
基金 supported by the National Ministries and Commissions (Grant Nos. 51308040203 and 6139801) the Fundamental Research Funds for the Central Universities (Grant Nos. 72105499 and 72104089) the Natural Science Basic Research Plan in Shaanxi Province of China (Grant No. 2010JQ8008)
关键词 strained Si hole effective mass 有效质量 应变效应 硅(111) 空穴 表面能量 传统观念 单调减少 密度
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参考文献9

  • 1SONG JianJun,ZHANG HeMing,HU HuiYong,FU Qiang.Calculation of band structure in (101)-biaxially strained Si[J].Science China(Physics,Mechanics & Astronomy),2009,52(4):546-550. 被引量:12
  • 2宋建军,张鹤鸣,戴显英,胡辉勇,宣荣喜.应变Si价带色散关系模型[J].物理学报,2008,57(11):7228-7232. 被引量:21
  • 3宋建军,张鹤鸣,戴显英,胡辉勇,宣荣喜.第一性原理研究应变Si/(111)Si(1-x)Gex能带结构[J].物理学报,2008,57(9):5918-5922. 被引量:28
  • 4Dhar S,Kosina H,Palankovski V, et al.Electron mobility model for strained-Si devices[].IEEE Transactions on Electron Devices.2005
  • 5Hu H Y,Zhang H M,Jia X Z, et al.Study on Si-SiGe three-dimen- sion CMOS integrant circuits[].Chinese Journal of Semiconductors.2007
  • 6T. Guillaume,M. Mouis.Calculations of hole mass in [110]-uniaxially strained silicon for the stress-engineering of p-MOS transistors[].Solid State Electronics.2006
  • 7Olsen S H,Yan L,Aqaiby Ret al.Strained Si/SiGeMOS technology:improving gate dielectric integrity[].Microelectronics Journal.2009
  • 8LIU En-ke,ZHU Bing-sheng,LUO Jin-sheng,et al.SemiconductorPhysics[]..1994
  • 9Z. Y. Gu,L. W. Tian,L. W. Fu.Semiconductor Physics (in Chinese)[]..1995

二级参考文献30

  • 1胡辉勇,张鹤鸣,戴显英,吕懿,舒斌,王伟,姜涛,王喜媛.含有δ掺杂层的SiGe pMOS量子阱沟道空穴面密度研究[J].物理学报,2004,53(12):4314-4318. 被引量:7
  • 2何焕典,王新强,罗强.锯齿型单壁碳纳米管束中管间相互作用对能隙的影响[J].人工晶体学报,2006,35(3):556-559. 被引量:1
  • 3李名复.半导体物理学[M].北京:科学出版社,1998.303-306.
  • 4胡辉勇 张鹤鸣 贾新章 戴显英 宣荣喜.半导体学报,2007,:2836-2836.
  • 5Shu Zh Y, Yang H D 2006 Chin. Phys. 15 1374
  • 6Chakraborty S, Bera M K, Bhattacharya S, Bose P K, Maiti C K 2006 Thin Solid Films 504 73
  • 7Guillaume T, Mouis M 2006 Solid-State Electronics 50 701
  • 8Smimov S, Kosina H 2004 Solid-State Electronics 48 1325
  • 9Levinshtein M E, Rumyantsev S L, Shur M S 2001 Properties of Advanced Semiconductor Materials ( New York : John Wiley & Sons)
  • 10Manku T, Nathan A 1991 Appl. Phys. 43 12634

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