离子束刻蚀正交位相型Ronchi光栅研究

Fabrication of Orthogonal Phase Ronchi Grating by Ion Beam Etching

本文报道了采用紫外光刻和离子束刻蚀方法制作正交位相型Ronchi光栅的工艺技术，并讨论其衍射效率，给出公式及实验结果．

An orthogonal phase Ronchi grating was fabricated by ultraviolet lithographing and ion beam etching. The experimental results of this grating with wavelength of 632.8 nm are given, and the diffraction characteristics of the Ronchi grating are discussed.