基于一维辐射转移方程的等离子体发射谱线线形模拟

Plasma Emission Line Shape Simulation Based on One-Dimensional Radiative Transfer Model

利用一维辐射转移理论模型对无自蚀现象存在时AlI(394.4 nm)和AlI(396.1 nm)在不同延迟时间下的谱线进行了模拟。为使结果更为可靠,模拟过程中对模型中的参数处理方式进行了改进,最大限度地减少了独立参数的个数,在此条件下给出了能级粒子数密度随延迟时间演化的空间分布情况。通过研究该模型中粒子数空间分布半径参数对谱线线形的影响,得到了谱线自蚀深度与谱线对应上下能级粒子数密度空间分布半径比值的关系并给出了分析结果。此外还研究了频移参数对谱线线形的影响,得出了判断谱线频移的依据,并从实验上得到了验证。

The line shapes of Al I（394.4 nm） and AI I（396.1nm） were theoretically simulated based on the onedimensional radiative transfer model without self-reverse effect. In order to get a more reliable result, an model improvement of the parameter handling approach was made to minimize the number of independent parameters. The revolution of spatial population density distribution of species was shown in different delay times. The effects of population density distribution parameters to the line profile were studied. The relationship between the depth of selfreverse and the population density distribution parameters ratio of lower and upper levels were analysed. A method to judging the line shift was experimentally verified by studying the effects of shift parameter to line profile too.