ECR-CVD制备类金刚石碳膜的正交实验法研究

Systematic Orthogonal Experiments Investigation for Diamond-like Carbon Deposition by ECR-CVD Method

采用系统的正交实验法对ECR-CVD法沉积类金刚石碳膜(DLC)的优化工艺进行研究,并分析不同工艺参数对DLC膜性能的影响。共选择基片温度、H2流量、微波功率、直流偏压、脉冲偏压以及脉冲偏压占空比6个参数建立起6因素5水平的正交表,分别以薄膜摩擦因数、磨损率、显微硬度、拉曼谱中D峰与G峰的面积比ID/IG作为考察对象进行研究。极差分析表明,对不同的考察因素其优化工艺略有区别。在所选的参数范围内,脉冲偏压对所测量的DLC膜的性能影响最大。

Systematic orthogonal experiments were performed in order to obtain the optimized parameters for diamond- like carbon （DLC） film deposition using ECR-CVD method and to find the influence degree of technological parameters on the properties of DLC film. Substrate temperature, H2 flow rate, microwave power, DC bias, pulse bias and duty factor of pulse bias were chosen as parameters for a six-factor-five-level orthogonal table and mechanical properties of DLC film such as friction coefficient, wear rate, micro-hardness and ratio of D-peak and G-peak area in Raman spectrum of the films were introduced as indexes, respectively. Range analysis show that for different index, the optimized combination of parameters is a little different. In selected parameter ranges, pulse bias is the most important factor affecting all of the measured properties.