摘要
详细介绍了如何在微机上实现 Ｊ Ｂ Ｘ６ Ａ Ｉ Ｉ型可变矩形电子束曝光机的数据格式转换工作。在熟悉通用图形数据 Ｃ Ｉ Ｆ格式和专用图形数据 Ｊ Ｅ Ｏ Ｌ５１ 格式的基础上，对如何实现 Ｃ Ｉ Ｆ格式到 Ｊ Ｅ Ｏ Ｌ５１ 格式的转换作了论述，并给出了程序流程图。此外，提出了两种曝光数据检验的方法，并对曝光实验中应注意的问题作了说明。
This paper discusses in detail how to realize data format conversion of JBX 6AⅡ variable shaped e beam lithography machine on microcomputer. It illustrates how to convert graphic data from CIF format to JEOL51 format on the basis of being familiar with these two formats, and the program charts are given. In addition, two methods of verifying exposure data are rendered, and the problems which we should pay attention to during exposure experiment are also presented.
出处
《微细加工技术》
1999年第3期6-13,共8页
Microfabrication Technology
关键词
电子束曝光
数据格式转换
图形分割
磁带机
e beam lithography
data format conversion
pattern cutting
tape machine
