期刊文献+

锑化物HEMT器件研究进展

Research progress in antimonide-based high electron mobility transistors
原文传递
导出
摘要 由于锑化物具有高电子迁移率和高电子饱和漂移速度等优越的材料性能,锑化物高电子迁移率晶体管(HEMT)微电子器件在制造新一代超高速、超低功耗电子器件和集成电路应用方面极具潜力,有很大的发展空间。本文中对锑化物HEMT的器件结构、器件结构改进、器件性能和应用等方面进行了评述,并指出了当前需要解决的关键问题及其广阔的发展前景。 Because antimonide-based compound semiconductors have excellent material performances such as high electron mobility and high electron saturation velocity,they have great potential and development space in the manufacture of the new generation of ultra-high speed,ultra-low power microelectronic devices and integrated circuits.Research progresses in device structures,device performances and applications of antimonide-based HEMTs are introduced and the existing problems of antimonide-based HEMTs and their vast potential for future development are also pointed out.
出处 《功能材料与器件学报》 CAS CSCD 北大核心 2011年第1期29-35,共7页 Journal of Functional Materials and Devices
基金 国家自然科学基金资助项目(60876004)
关键词 锑化物半导体 高电子迁移率晶体管 HEMT ABCS 研究进展 antimonide-base compound semiconductors high electron mobility transistors HEMT ABCS research progress
  • 相关文献

参考文献24

  • 1Rosker M. The W;de and the Narrow: DARPA/MTO Programs for RF Applications in Wide Bandgap and Antimohide - Based Semiconductors [ C }. IEEE CSIC SYMPOSI- UM, TECHNICAL DIGEST, 2005 : 13 - 16.
  • 2Chou Y C, Yang J M, Lin C H, et al. Manufacturable and Reliable 0.1 um A1Sb/InAs HEMT MMIC Technology for Ultra- Low Power Applications [ C]. IEEE/MTF- S IN- TERNATIONAL MICROWAVE SYMPOSIUM DIGEST, 2007 : 461 - 464.
  • 3Nguyen L D, Larson L E, Mishra U K, et al. Ultra -high - speed modulationdoped fieht - effect transistors - a tutorial review[J]. Proc IEEE, 1992, 80(4) :494 -518.
  • 4Nguyen L D, Schaff W J, Tasker P J, et aI. Charge control, DC, and RF peril)finance of a 0.35 - gtm pseudomorphic AlGaAs/InGaAs modulation - doped field - effect transistor[ J ]. Electron Devices, 1988 (35) : 139.
  • 5Fathimulla A, Abrahanls J, Loughran T, et al. High - performance lnA1As/InGaAs HEMTs and MESFETs [ J]. Electron Device Letters, 1988 (9) :328.
  • 6Bennett B R, Tinkham B P, Boos J B, et al. Materials growth for lnAs high elec:tron mobility transistors and cireuits[J]. J Vac Sei Teehnol B, 2004, 22(2) .688 -694.
  • 7Venkatasubramanian R, Dorsey D L, Mahalingam K. Heuristicrules for group IV dopant site selection in III- V compounds [ J ]. J Cryst Growth, 1997, 175:224 - 228.
  • 8Borg M, Lefebvre E, Malmkvist M, et al. Effect of gate length in InAs/A1Sb HEMTs biased for low power or high gain [ J ]. Solid - State Electronics, 2008, 52 : 775 - 781.
  • 9Boos J B, Yang M J, Bennett B R, et al. 0.1 lm A1Sb/I- nAs HEMTs with InAs subchannel [ J ]. Electron Lett, 1998, 34(15) :1525 1526.
  • 10Lin H K, Kadow C, Dahlstrom M, et al. InAs/lnAsP composite channels for antimonide - based field - effect transistors[ J]. Appl Phys Lett , 2004, g4 (3) : 437 - 439.

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部