微电子光刻实验净化工作台设计

A new clean bench design for microelectronics lithography

提出了一种导流分压式双正压净化工作台。分析了该工作台的结构特征及工作原理。通过与常规垂直层流净化工作台的比较及实验结果分析,指出了该产品的经济性、优越性及应用前景。

A new parallel flow diversion cleaning bench with two positive pressure zones is designed.The advantages of the structure are analyzed by experiments and a reasonable explanation about how the bench work is discussed.Compared with the regular horizontal f low cleaning bench,the new structure bench is competed in its application field.